HuaHsuan Chen

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Speaker, Author, Co-Author

Thu. Sep 19, 2019 1:45 PM - 5:45 PM E305 (E305)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[19p-E305-1~15] 13.3 Insulator technology

2:45 PM - 3:00 PM

▲ [19p-E305-5] Effect of Hydrogen Neutral Beam Treatment on Atomic layer deposition SiO₂

〇HuaHsuan Chen¹, Bei Bei Ge¹, Susumu Toko¹, Daisuke Ohori¹, Takuya Ozaki¹, Tomohiro Kubota², Mitsuya Utsuno², Toshihisa Nozawa², Seiji Samukawa³ (1.IFS,Tohoku Univ., 2.ASM Japan K.K., 3.AIMR, Tohoku Univ.)