11:15 AM - 11:30 AM
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[20a-B31-9] Characteristics of oxide TFT using carbon-doped In2O3 thin films
by low-temperature ALD
〇Riku Kobayashi1,2, Toshihide Nabatame2, Kazunori Kurishima2,3, Takashi Onaya1,2,4, Akihiko Ohi2, Naoki Ikeda2, Takahiro Nagata2, Kazuhito Tsukagoshi2, Atsushi Ogura1 (1.Meiji Univ., 2.WPI-MANA NIMS, 3.JSPS Research Fellow PD, 4.JSPS Research Fellow DC)