Shin Ogawa

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Speaker, Author, Co-Author

Fri. Sep 20, 2019 9:30 AM - 11:30 AM PA4 (PA)

Poster presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:30 AM - 11:30 AM

[20a-PA4-8] Numerical Analysis of Influence of H₂ Dilution Rate on DLC Deposition Rate
using H₂/CH₄ Plasma-Enhanced CVD Model

〇(M2)Shin Ogawa¹, Akinori Oda¹, Takayuki Ohta², Hiroyuki Kousaka³ (1.Chiba Tech, 2.Meijo Univ., 3.Gifu Univ.)