Fumimasa Horikiri

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Speaker, Author, Co-Author

Fri. Sep 20, 2019 1:30 PM - 5:35 PM E301 (E301)

Symposium (Oral)
| Symposium (technical)
| Etching Technology for Nitride Semiconductors: recent progress in high-controllable and low-damaging process

[20p-E301-1~9] Etching Technology for Nitride Semiconductors: recent progress in high-controllable and low-damaging process

2:35 PM - 3:05 PM

[20p-E301-4] Wet-etching of GaN for power and RF devices

〇Fumimasa Horikiri¹, Noboru Fukuhara¹ (1.SCIOCS)