Masaya Hayashi

→ Search for Masaya Hayashi in Google Scholar

Speaker, Author, Co-Author

Sat. Sep 21, 2019 9:00 AM - 10:45 AM E311 (E311)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[21a-E311-1~7] 15.6 Group IV Compound Semiconductors (SiC)

10:00 AM - 10:15 AM

[21a-E311-5] Influence of Reaction Heat on SiC Epitaxial Reactor Cleaning Using ClF₃ Gas

〇Masaya Hayashi¹, Hitoshi Habuka¹, Keisuke Kurashima¹, Hideki Ito², Shin-ichi Mitani², Ichiro Mizushima², Yoshinao Takahashi³ (1.Yokohama Nat. Univ, 2.NuFlare Technology, 3.KANTO DENKA KOGYO)