Oral presentation
[20a-E307-1~6] 7.3 Micro/Nano patterning and fabrication
Fri. Sep 20, 2019 10:00 AM - 11:45 AM E307 (E307)
Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)
△:Presentation by Applicant for JSAP Young Scientists Presentation Award
▲:English Presentation
▼:Both of Above
No Mark:None of Above
10:00 AM - 10:15 AM
[20a-E307-1] Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplifed Resist
〇Hiroki Yamamoto1, Yannick Vesters2,3, Jing Jiang2, Danilo de Simone2, Geert Vandenberghe2, Takahiro Kozawa4 (1.QST, 2.IMEC, 3.KU Leuven, 4.ISIR, Osaka univ.)
10:15 AM - 10:30 AM
〇(M2)Shunpei Kawai1, Kazumasa Okamoto2, Masato Ohnuma1, Takahiro Kozawa2 (1.Hokkaido Univ., 2.Osaka Univ.)
10:30 AM - 10:45 AM
▲ [20a-E307-3] Improvement of Line-Edge Roughness on Pt-based Ultrafine Nanorods by Post-Exposure Bake
〇JAEYEON KIM1, Ryo Toyama1, Yutaka Majima1 (1.Tokyo Institute of Technology)
11:00 AM - 11:15 AM
〇Toshiyuki Horiuchi1, Yoshie Imon1, Kazuya Sumimoto1, Akira Yanagida1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
11:15 AM - 11:30 AM
〇Hiroaki Kawata1, Shingo Shimizu1, Masaaki Yasuda1, Yoshihiko Hirai1 (1.Osaka Pref. Univ.)
11:30 AM - 11:45 AM
〇(B)Naho Kaneko1, Tomoaki Oga1, Atsushi Oshima1, Satoru Kaneko2,1, Akifumi Matsuda1, Mamoru Yoshimoto1 (1.Tokyo Tech. Materials, 2.KISTEC)