The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[20a-E307-1~6] 7.3 Micro/Nano patterning and fabrication

Fri. Sep 20, 2019 10:00 AM - 11:45 AM E307 (E307)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

11:15 AM - 11:30 AM

[20a-E307-5] Fabrication of self-standing PS film with small through holes by casting process.

Hiroaki Kawata1, Shingo Shimizu1, Masaaki Yasuda1, Yoshihiko Hirai1 (1.Osaka Pref. Univ.)

Keywords:self-standing film, through-holes, water soluble polymer

A simple fabrication process is developed for self-standing resin films with well-defined through-holes by use of casting process, which is one of the imprint techniques. Polystyrene (PS), which is one of the most popular resin is used. Polyvinyl alcohol (PVA) film, which can be dissolved in water, is used as a sacrificial film. No plasma process for residual layer remove is used. A mold pattern is directly transferred to the PVA film, and PS resin is coated on the patterned PVA film. The PVA sacrificial film is removed in hot water. A defect free PS self-standing film with through-holes of 2.5 μm square can be obtained in the fixing frame with 5 mm diameter hole. The obtained PS film thickness is about 0.7 μm.