The 80th JSAP Autumn Meeting 2019

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13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18a-E304-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Wed. Sep 18, 2019 9:30 AM - 11:45 AM E304 (E304)

Seiichiro Higashi(Hiroshima Univ.), Tatsuya Okada(Univ. of the Ryukyus)

10:15 AM - 10:30 AM

[18a-E304-4] Performance of Four-Terminal Low-Temperature Poly-Si TFT with High-k Gate Stack on Glass Substrate

〇Naoki Nishiguchi1, Akito Hara1 (1.Tohoku Gakuin Univ)

Keywords:thin film transistor, Si, high-k