[18a-PB3-1~47] 15.4 III-V-group nitride crystals

[18a-PB3-38] Growth of h-BN thin films on Si (111) substrates by low-pressure CVD

〇Kazuki Matsushita¹, Tomoyasu Nakama¹, Taira Watanae¹, Hiroko Kominami¹, Kazuhiko Hara^2,3 (1.GSIST Shizuoka univ., 2.GSST Shizuoka univ., 3.RIE Shizuoka univ.)

Keywords:h-BN, CVD, Si substrate