The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[18p-B31-1~16] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Wed. Sep 18, 2019 1:15 PM - 6:00 PM B31 (B31)

Kouichi Akahane(NICT), Sachie Fujikawa(Tokyo Denki University), Nobuaki Kojima(Toyota Tech. Inst.)

1:30 PM - 1:45 PM

[18p-B31-2] Metallic selenides as the buffers for GaAs grown on Si (111)

〇(PC)YUCIAN WANG1, Nobuaki Kojima1, Kei Kawakatsu1, Akio Yamamoto1, Yoshio Ohshita1, Masafumi Yamaguchi1 (1.Toyota Technological Institute)

Keywords:metal selenides, twin formation, GaAs/Si

Growth of heteroepitaxial GaAs layers on Si substrates is attractive because of its possible application for monolithically integrated electronic and optoelectronic devices. For the GaAs grown on Si or Ge (111), there are several potential merits to extend their applications. In this study, the crystalline improvement of GaAs grown on metal (Ga or In) selenides films is studied. We have found that the inevitable bonding between Ga and Se on the top of In2Se3 was observed. Further, the wettability of the GaAs nucleus has been improved by irradiating Ga2Se3 surface with As, Ga, and Se simultaneously. The twin-domain less than 2% for 1 μm-GaAs grown on an In2Se3/Si (111)4o off-cut to [11-2] has been achieved by introducing Ga2Se3 on In2Se3 with the subsequent (As-Ga-Se) treatment.