The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[18p-B31-1~16] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Wed. Sep 18, 2019 1:15 PM - 6:00 PM B31 (B31)

Kouichi Akahane(NICT), Sachie Fujikawa(Tokyo Denki University), Nobuaki Kojima(Toyota Tech. Inst.)

3:00 PM - 3:15 PM

[18p-B31-7] 1.6 μm-band Emission from Metamorphic InAs Quantum Dots on GaAs Substrates

Wenbo Zhan1, Satomi Ishida2, Jinkwan Kwoen1, Katsuyuki Watanabe1, Satoshi Iwamoto1,3, Yasuhiko Arakawa1 (1.NanoQuine, 2.RCAST, 3.IIS, Univ. of Tokyo)

Keywords:quantum dot, metamorphic

Quantum dot lasers (QDLs) have widely studied since the concept of QD was firstly proposed in the 1980s. To meet the growing demands for optical telecommunications, InAs/GaAs QDLs with high performance at O-band have been achieved. Research on extending the emission wavelength of InAs/GaAs QDs to C- / L-band with keeping high emission efficiency now attract much attention, because of its potential to developing low-cost lasers in the ultra-long-haul optical transmission system. Here, we report 1.6 μm emission from metamorphic InAs quantum dots on GaAs substrates at room temperature.