The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.1 Bulk crystal growth

[18p-E207-1~11] 15.1 Bulk crystal growth

Wed. Sep 18, 2019 1:15 PM - 5:15 PM E207 (E207)

Yuui Yokota(Tohoku Univ.), Hiroki Sato(Tohoku Univ.)

4:00 PM - 4:15 PM

[18p-E207-7] X-ray topography and optical charcterization of ScAlMgO4 (SCAM) single crystals grown by CZ method

Takashi Fujii1,2, Tsuguo Fukuda1, Tsutomu Araki2, Kazumasa Sugiyama3, Kotaro Ishiji4, Ryuichi Sugie5 (1.Fkuda Crystal Lab., 2.Ritsumeikan Univ., 3.IMR, 4.SAGA-LS, 5.TRC)

Keywords:ScAlMgO4, dislocation-free, GaN

We have studied the ScAlMgO4 (SCAM) single crystals, which are attracting attention for GaN epitaxial substrate. Now, we observed the X-ray refracting topography and characterized the optical performance of SCAM. The c-face SCAM wafer with 40mm in diameter was obtained from the bulk single crystal grown by CZ method. As a result, any dislocations were not found in a wide range of wafer. Then, it becomes clear that the SCAM crystals were dislocation-free like Si crystals. Furthermore, we have characterized the optical performance of SCAM.