[18p-F211-1~6] 8.6 Plasma Electronics English Session

▼ [18p-F211-6] Time Evolution of Deposition of Carbon Nanoparticles Synthesized by Ar+CH₄ Plasmas

〇SungHwa Hwang¹、Kunihiro Kamataki¹、Naho Itagaki¹、Kazunori Koga^1,2、Masaharu Shiratani¹ (1.Kyushu Univ、2.NINS)

キーワード：carbon nanoparticles, plasma chemical vapor deposition

Among many methods for synthesizing carbon nanoparticles (CNPs), plasma is a promising method that continuously produces high purity size-controlled CNPs and uniformly deposits onto substrates So far, we have succeeded in controlling their size by the gas residence time in discharge regions. However, for their application to nano-technologies, understanding deposition of CNPs and its control are important. Here we have measured the time dependence on CNPs deposition quantitatively.