[18p-PA5-1~22] 6.4 Thin films and New materials

[18p-PA5-12] Fabrication of HfO₂ film by reactive evaporation method and antireflection coat for UV

〇Koichi Muro¹, Masayuki Sakai¹ (1.Asahi Spectra Co., Ltd.)

Keywords:reactive evaporation, HfO2, ultra violet light

In the deposition of optical thin films, metal-oxides are used as a starting material generally, but there are problems such as ununiformity due to digging of materials and bumps due to splashing. Therefore, we examined the deposition of metal-oxides starting from metal materials using reactive evaporation method. In this time, we report the fabrication of HfO2 films for ultraviolet light.