Fabrication of α-Ir2O3 thin film using O3 gas by mist CVD

Presentation information

Poster presentation

Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Wed. Sep 18, 2019 4:00 PM - 6:00 PM PB5 (PB)

4:00 PM - 6:00 PM

〇Yasuhisa Masuda¹, Kentaro Kaneko¹, Takashi Shinohe², Shizuo Fujita¹ (1.Graduate School of Eng., Kyoto Univ., 2.FLOSFIA INC.)

Keywords:iridium oxide