Yasuhisa Masuda

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 4:00 PM - 6:00 PM PB5 (PB)

Poster presentation
| Joint Session K
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[18p-PB5-1~36] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

4:00 PM - 6:00 PM

[18p-PB5-2] Fabrication of α-Ir₂O₃ thin film using O₃ gas by mist CVD

〇Yasuhisa Masuda¹, Kentaro Kaneko¹, Takashi Shinohe², Shizuo Fujita¹ (1.Graduate School of Eng., Kyoto Univ., 2.FLOSFIA INC.)