[19p-B11-1~8] Interfacial Nano Electrochemistry - Diversification of Semiconductor Wet Process

[19p-B11-8] Effect of concertation of the etching solution on formation of Si-TSVs using metal-assisted chemical etching

〇Takuya Yorioka¹, Shunsuke Hanatani¹, Takeshi Ito¹, Tomohiro Shimizu¹, Shoso Shingubara¹ (1.Kansai Univ.)

Keywords:wet etching, silicon