The 80th JSAP Autumn Meeting 2019

Presentation information

Symposium (Oral)

Symposium (technical) » Advanced ion microscopy? Application for future nano scale materials and devices

[19p-E302-1~8] Advanced ion microscopy? Application for future nano scale materials and devices

Thu. Sep 19, 2019 1:30 PM - 5:30 PM E302 (E302)

Shu Nakaharai(NIMS), Reo Kometani(Univ. of Tokyo), Hiroshi Mizuta(JAIST), Shinichi Ogawa(AIST)

3:45 PM - 4:00 PM

[19p-E302-5] Helium Ion Beam Milling Patterned Suspended Graphene Double Quantum Dots

〇(DC)WANG Zhongwang1, Manoharan Muruganathan1, Marek Edward Schmidt1, Yukinori Morita2, Shinichi Ogawa2, Hiroshi Mizuta1,3 (1.JAIST, 2.AIST, 3.Hitachi Cambridge)

Keywords:Suspended Nanostructure, Helium Ion Beam Milling

We present a procedure for the fabrication of suspended graphene double quantum dots using helium ion beam milling technique (HIBM). A relatively large suspended graphene nanoribbon was prefabricated through conventional NEMs fabrication process. Importantly, seven electrodes were attached on it that pulled the nanoribbon and protected it from deformation during the substrate etching process. Thereafter, HIBM has carried out to pattern the small double dots structure. Importantly, the structure was suspended after HIBM. We envisage that this method can be utilized to patterning other two-dimensional materials for other NEMS, MEMS applications, such as coupled mechanical resonator-quantum dot.