The 80th JSAP Autumn Meeting 2019

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[19p-E305-1~15] 13.3 Insulator technology

Thu. Sep 19, 2019 1:45 PM - 5:45 PM E305 (E305)

Toshifumi Irisawa(AIST), Kiyoteru Kobayashi(Tokai Univ.)

4:45 PM - 5:00 PM

[19p-E305-12] Introduction of Hf-Post Metallization Annealing at GeO2/Ge interface

〇(M1)Haruka Horiguchi1, Yoshitaka Iwazaki1, Tomo Ueno1 (1.TAT)

Keywords:MOS structure, Post Metallization Annealing, Ge