The 80th JSAP Autumn Meeting 2019

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[19p-E305-1~15] 13.3 Insulator technology

Thu. Sep 19, 2019 1:45 PM - 5:45 PM E305 (E305)

Toshifumi Irisawa(AIST), Kiyoteru Kobayashi(Tokai Univ.)

5:15 PM - 5:30 PM

△ [19p-E305-14] Low Temperature (<300°C) Fabrication of Ge MOS Structure for Advanced Electronic Devices

〇(M2)Kento Iseri1, Wei-Chen Wen1, Keisue Yamamoto1, Dong Wang1, Hiroshi Nakashima2 (1.IGSES, Kyushu Univ., 2.GIC, Kyushu Univ.)

Keywords:semiconductor, Ge, Gate stack