The 80th JSAP Autumn Meeting 2019

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Oral presentation

15 Crystal Engineering » 15.5 Group IV crystals and alloys

[19p-E313-1~9] 15.5 Group IV crystals and alloys

Thu. Sep 19, 2019 1:30 PM - 3:45 PM E313 (E313)

Masashi Kurosawa(Nagoya Univ.)

2:45 PM - 3:00 PM

[19p-E313-6] Effects of insertion of diffusion stop layer into P-doped Ge-on-Si

〇(M1)Kodai Yamada1, Yuta Kumazawa1, Takuya Maruizumi1, Kentaro Sawano1 (1.Tokyo City Univ.)

Keywords:P-dope, Ge-on-Si