Renewal of EUV beamline (BL18) at SAGA Light Source and feasibility exposures of PMMA resist

Akio Yoneyama; Taro Kawata

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.1 X-ray technologies

[19p-E318-1~10] 7.1 X-ray technologies

Thu. Sep 19, 2019 1:30 PM - 4:30 PM E318 (E318)

Mitsunori Toyoda(Tokyo Polytechnic Univ.), Toshihide Tsuru(Yamagata Univ.)

2:30 PM - 2:45 PM

[19p-E318-5] Renewal of EUV beamline (BL18) at SAGA Light Source and feasibility exposures of PMMA resist

〇Akio Yoneyama¹, Taro Kawata^1,2 (1.SAGA Light Source, 2.Tokyo Institute of Technology)

Keywords:EUV, PMMA

EUV Beamline (BL18) at SAGA Light Source was renewed for evaluation of EUV resist sensitivity and measurement of reflectivity of optical mirror. A feasibility exposure of PMMA resist (thickness 200nm) was performed and the whole resist was exposed within 40 s.