[20a-B11-1~10] 8.1 Plasma production and diagnostics

[20a-B11-6] Pulse and power controls in modulated pulsed power magnetron sputtering and the optical emission spectroscopy

〇(M1)Yuki Nakagomi¹, Tatsuya Watabe¹, Mutsuki Hirayama¹, Ryosuke Kaneyuki¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Hiroaki Yamamoto², Masahide Tona², Keizo Tsukamoto², Keijiro Ohshimo³, Fuminori Misaizu³ (1.Tokyo Polytechinic Univ., 2.Ayabo Corp, 3.Tohoku Univ.)

Keywords:magnetron sputtering, plasma diagnostics, optical measurement

Modulated pulsed power magnetron sputtering (MPPMS) which is one of several types of high power pulsed magnetron sputtering (HPPMS) is the sputtering system in advantage for arcing-suppression control. In the JSAP meetings, we have reported on the discharge characteristics for sputtering using titanium as target and argon as working gas through optical emission spectroscopy for MPPMS plasma generated by controlling the macro- and micro-pulses designed individually. In this presentation, we report on the results for the combined control of macro- and micro- pulses in MPPMS on behalf of the individual control of macro- and micro- pulses, and on the results for the power controls in MPPMS.