The 80th JSAP Autumn Meeting 2019

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7 Beam Technology and Nanofabrication » 7.5 Ion beams

[20a-E203-1~12] 7.5 Ion beams

Fri. Sep 20, 2019 9:00 AM - 12:15 PM E203 (E203)

Junichi Yanagisawa(Univ. of Shiga Pref.), Satoshi Ninomiya(Univ. of Yamanashi)

11:45 AM - 12:00 PM

[20a-E203-11] Study of high-aspect-ratio etching with reactive gas cluster injection

〇Toshio Seki1, Tadashi Syojo2, Kunihiko Koike2, Takaaki Aoki3, Jiro Matsuo1 (1.Grad. Sch. of Eng., Kyoto Univ., 2.Iwatani Corp., 3.ACCMS, Kyoto Univ.)

Keywords:cluster, neutral beam, high-aspect-ratio etching