Toshio Seki

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Speaker, Author, Co-Author

Fri. Sep 20, 2019 9:00 AM - 12:15 PM E203 (E203)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.5 Ion beams

[20a-E203-1~12] 7.5 Ion beams

11:45 AM - 12:00 PM

[20a-E203-11] Study of high-aspect-ratio etching with reactive gas cluster injection

〇Toshio Seki¹, Tadashi Syojo², Kunihiko Koike², Takaaki Aoki³, Jiro Matsuo¹ (1.Grad. Sch. of Eng., Kyoto Univ., 2.Iwatani Corp., 3.ACCMS, Kyoto Univ.)

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