[20a-E307-1~6] 7.3 Micro/Nano patterning and fabrication

▲ [20a-E307-3] Improvement of Line-Edge Roughness on Pt-based Ultrafine Nanorods by Post-Exposure Bake

〇JAEYEON KIM¹, Ryo Toyama¹, Yutaka Majima¹ (1.Tokyo Institute of Technology)

Keywords:line-edge roughness, post-exposure bake, electron-beam lithography

In this study, we demonstrate the reduction in linewidth and improvement of LER on Pt-based ultrafine nanorods by PEB.