[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-3] Control of Hydroxyapatite crystal orientation by sputtering

〇(M1)Tomoya Oda¹, Tsukasa Nakamura¹, Shinji Takayanagi¹, Mami Matsukawa¹ (1.Doshisha Univ.)

Keywords:sputtering, hydroxyapatite