Session information

Poster presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Sep 20, 2019 9:30 AM - 11:30 AM PA4 (PA)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:30 AM - 11:30 AM

[20a-PA4-1] Two-dimensional thin films preparation by PLD using powder target I

〇Hiroharu Kawasaki¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Masanori Shinohara¹, Yoshiaki Suda² (1.Nat. Ins. Tech, Sasebo Col., 2.Nat. Ins. Tech, Ishikawa Col.)

9:30 AM - 11:30 AM

[20a-PA4-2] Local synthesis of DLC thin films by atmospheric pressure μ plasma jet.

〇(B)Ryota Nishimura¹, Hiroyuki Yoshiki¹ (1.National Institute of Technology, Tsuruoka College)

9:30 AM - 11:30 AM

[20a-PA4-3] Control of Hydroxyapatite crystal orientation by sputtering

〇(M1)Tomoya Oda¹, Tsukasa Nakamura¹, Shinji Takayanagi¹, Mami Matsukawa¹ (1.Doshisha Univ.)

9:30 AM - 11:30 AM

[20a-PA4-4] Supetter Epitaxy of (ZnO)_x(InN)_1-x Films on Sapphire Substrates:Observation of Morphological Evolution

〇Kentaro Kaneshima¹, Nanoka Miyahara¹, Seiichi Urakawa¹, Daisuke Yamashita¹, Kunihiro Kamataki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ)

9:30 AM - 11:30 AM

▲ [20a-PA4-5] Morphological Characterization of RF Magnetron Sputtered Zinc Oxide Thin Films-Laser Assisted

〇(M2)Edrick Abu Saidu¹, Akio Sanpei¹, Wataru Wakaki¹, Yasuaki Hayashi¹, Haruhiko Himura¹ (1.Kyoto Inst. of Tech.)

9:30 AM - 11:30 AM

[20a-PA4-6] Low temperature synthesis of Al₂O₃ thin film by low energy electron and oxygen radical irradiation on Al(CH₃)₃ condensed layer

〇(M1)Atsuki Okawa¹, Daichi Yamada², Yohei Otani², Tetsuya Sato¹ (1.Univ. of Yamanashi, 2.Tokyo Univ. of Science, Suwa)

9:30 AM - 11:30 AM

[20a-PA4-7] Droplet-Vaporization Behavior in Plasma during Plasma-assisted Mist Chemical Vapor Deposition (II)

〇Kosuke Takenaka¹, Yuichi Setsuhara¹ (1.Osaka Univ.)

9:30 AM - 11:30 AM

[20a-PA4-8] Numerical Analysis of Influence of H₂ Dilution Rate on DLC Deposition Rate
using H₂/CH₄ Plasma-Enhanced CVD Model

〇(M2)Shin Ogawa¹, Akinori Oda¹, Takayuki Ohta², Hiroyuki Kousaka³ (1.Chiba Tech, 2.Meijo Univ., 3.Gifu Univ.)

9:30 AM - 11:30 AM

[20a-PA4-9] Preparation of Au-ZnO composite film using open-air microplasma jet and its photocatalytic property (Ⅱ)

〇Yoshiki Shimizu¹, Kazuto Hatakeyama¹, Yoshie Ishikawa¹ (1.Nanomaterials RI, AIST)

9:30 AM - 11:30 AM

[20a-PA4-10] Nitrogen Plasma Processing of Photocatalyst by using Electron Beam Excited Plasma

〇(M2)Hayato Tomii¹, Yuichirou Takemura¹ (1.Kindai Univ.)

9:30 AM - 11:30 AM

[20a-PA4-11] Plasmonic Sensor Using Silver Nanoparticles Exposed to Plasma for Detection of Binary-Mixture Organic Vapor

〇(D)Kei Hosomi¹, Koichi Ozaki¹, Katsumi Takahiro¹, Fumitaka Nishiyama², Shin Yokoyama² (1.Kyoto Inst. Tech., 2.Hiroshima Univ.)

9:30 AM - 11:30 AM

[20a-PA4-12] Effect of Microwave Excited Hydrogen and Ammonia Gas Mixture Plasma on Hydrogenation of Sodium Metaborate

〇Naoki Maeda¹, Akihisa Ogino¹ (1.Shizuoka Univ.)

9:30 AM - 11:30 AM

[20a-PA4-13] Measurement of Negative Ion Signal in a Discharge between Carbon Electrodes by Laser Photodetachment

〇Yuito Ikeda¹, Nobuteru Tsubouchi², Motoi Wada¹ (1.Doshisha Univ., 2.AIST kansai center)

9:30 AM - 11:30 AM

[20a-PA4-14] Thermionic Emission Characteristics of Cesiated Al_xGa_1-xN Emitter

〇Shota Uchida¹, Shigeya Kimura², Hisashi Yoshida², Akihisa Ogino¹ (1.Shizuoka Univ., 2.Toshiba Corp.)

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