Kosuke Takenaka

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 5:15 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18p-C309-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:45 PM - 5:00 PM

[18p-C309-12] Low-temperature Formation of High-Mobility IGZO Thin Film Transistors using Reactive Plasma Processes

Yuichi Setsuhara¹, 〇Kosuke Takenaka¹, Hiroyuki Hirayama¹, Masashi Endo¹, Giichiro Uchida², Akinori Ebe³ (1.Osaka Univ., 2.Meijo Univ., 3.EMD Corp.)

Fri. Sep 20, 2019 9:30 AM - 11:30 AM PA4 (PA)

Poster presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:30 AM - 11:30 AM

[20a-PA4-7] Droplet-Vaporization Behavior in Plasma during Plasma-assisted Mist Chemical Vapor Deposition (II)

〇Kosuke Takenaka¹, Yuichi Setsuhara¹ (1.Osaka Univ.)