The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20p-B31-1~17] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Fri. Sep 20, 2019 1:45 PM - 6:30 PM B31 (B31)

Takayoshi Oshima(FLOSFIA), Kohei Fujiwara(Tohoku Univ.), Kazuyuki Uno(Wakayama Univ.)

2:30 PM - 2:45 PM

[20p-B31-4] Investigation of transport property reductions in epitaxial La-doped BaSnO3 films

HaiJun Cho1, Bin Feng2, Takaki Onozato1, Mian Wei1, Anup Sanchela1, Yuichi Ikuhara2, Hiromichi Ohta1 (1.Hokkaido Univ., 2.Univ. of Tokyo)

Keywords:Transparent oxide semiconductor, Transport properties, Electron microscopy

La-doped BaSnO3 (LBSO) exhibits a wide bandgap (~3.5 eV) and high single crystal electron mobility (320 cm2 V1 s1) at high electron density, which are ideal transparent oxide semiconductor characteristics for optoelectronic applications. However, the mobility observed from LBSO thin films is much lower compared to the single crystal value. Most studies attribute this phenomenon to the threading dislocations from the lattice mismatch between LBSO/substrate, but the threading dislocations do not fully explain the mobility suppression in LBSO films. In this work, we discuss different factors dominating the mobility of LBSO films and the limitations in aiming the single crystal mobility in LBSO films.