2019年第80回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

10 スピントロニクス・マグネティクス » 10.2 スピン基盤技術・萌芽的デバイス技術

[20p-E216-8~20] 10.2 スピン基盤技術・萌芽的デバイス技術

2019年9月20日(金) 15:30 〜 19:00 E216 (E216)

三輪 真嗣(東大)、大兼 幹彦(東北大)

18:15 〜 18:30

[20p-E216-18] Large spin signals of local 3-terminal spin valve effect in n-Si/MgO/Co2Fe0.4Mn0.6Si lateral structured devices at low temperature

Takeo Koike1、Mikihiko Oogane1、Masakiyo Tsunoda1、Yasuo Ando1 (1.Tohoku Univ.)

キーワード:Spin injection, Heusler alloy

Spin transports between two ferromagnetic (FM) electrodes on a semiconductor (SC) channel have been demonstrated by many groups using non-local Hanle and spin-valve measurements. However, the obtained magnetoresistance ratio was considerably small because spin polarizations of the FM materials are small. For the enhancement of spin signals, Co-based Heusler alloys are promising materials as the FM electrode because of their high spin polarizations. In a previous work, we successfully fabricated B2 ordered Co2Fe0.4Mn0.6Si (CFMS) films with high saturation magnetization on Si(100) substrates. In this work, we investigated post annealing temperature dependence of the local 3-terminal spin valve signals through the n-type Si channel using CFMS electrode. As a results, we obtained the L-3TSV signal of ~370 µV at 10 K for the CFMS sample with annealing temperature 350℃, which is 3 times larger than that for the CoFe.