[20p-E305-1~7] 2.3 Application, radiation generators, new technology

△ [20p-E305-3] Pt coating for X-ray optics using plasma atomic layer deposition

〇(M2)Aoto Fukushima¹, Daiki Ishi¹, Yuichiro Ezoe¹, Kumi Ishikawa², Masaki Numazawa¹, Ryota Otsubo¹, Hikaru Suzuki¹, Tatsuya Yuasa¹, Tomoki Uchino¹, Sae Sakuda¹, Kazuhisa Mitsuda², Mark J. Sowa³ (1.TMU, 2.ISAS, 3.Ultratech)

Keywords:atomic layer deposition, X-ray optics, dry etching

We have been developing an ultra lightweight X-ray optic based on MEMS technologies. Curvilinear micropores 20 μm wide are fabricated with dry etching on Si wafer and used the sidewalls as X-ray mirrors. While Si is relatively easy to be processed, the X-ray reflectivity is smaller than heavier materials. We focused on atomic layer deposition using O₂ plasma and demonstrated smooth Pt coating for micropores. We will report on fabrication and evaluation methods for Pt-coated X-ray optics.