[20p-N304-1~10] Latest trend on atomic layer processes

[20p-N304-4] RT atomic layer deposition and its application to gas barrier

Kensaku Kanomata², Masanori Miura², 〇Fumihiko Hirose¹ (1.Yamagata Univ., 2.ROEL, Yamagata Univ.)

Keywords:atomic layer deposition, room temperature, gas barrier

RT atomic layer depostion was developed and its application to gas barrier is explained in the conference. In the development, in situ obsevation of surface reaction was performed to illucidate the rate-limiting reaction. The plasma system was also devloped base on the obseravation. In the conference, experimental results of Al₂O₃ and SiO₂ ALDs are released. Application to gas barrier is also demonstrated.