[20p-PB2-1~18] 7 Beam Technology and Nanofabrication (Poster)

[20p-PB2-7] Advances of Resonant Hard X-ray Photoelectron Spectroscopy and its applications

〇Akira Yasui¹, Naomi Kawamura¹, Eiji Ikenaga^2,1, Masaichiro Mizumaki¹, Satoshi Tsutsui¹, Kojiro Mimura³ (1.JASRI, 2.Nagoya Univ. IMaSS, 3.Osaka Pref. Univ.)

Keywords:Hard X-ray photoelectron spectroscopy, buried surface, photocatalysts

We have developed a technique of the resonant measurement in HAXPES region with continuous tuning of photon energy in SPring-8 BL09XU. The resonant HAXPES enables us to analyze the detail electronic properties of materials, adding the element and atomic valence selectivity due to the resonant excitation to the advantage of HAXPES which can investigate the chemical bonding states in the buried surface. Recently, this technique is attracting much attention in various applications, such as photocatalyst study.