Tomoki Oku

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 9:30 AM - 11:30 AM PB2 (PB)

Poster presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11a-PB2-1~10] 13.3 Insulator technology

9:30 AM - 11:30 AM

[11a-PB2-1] Cause of generating the penetration barrier of H₂O molecule into SiO₂ and Si₃N₄ films

〇Tomoki Oku¹, Masahiro Totsuka¹, Hajime Sasaki¹ (1.Mitsubishi Electric)