Charisse Cagomoc

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:45 PM - 3:00 PM

▼ [11p-W641-5] Molecular Dynamics Simulation of SiO₂ Etching by Energetic Fluorocarbon Ions

〇(M2)Charisse Cagomoc¹, Michiro Isobe¹, Satoshi Hamaguchi¹ (1.Osaka University)