Yoshiyuki Nakayama

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Speaker, Author, Co-Author

Sun. Mar 10, 2019 9:00 AM - 10:45 AM W241 (W241)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma nanotechnology

[10a-W241-1~7] 8.3 Plasma nanotechnology

10:15 AM - 10:30 AM

△ [10a-W241-6] Fabrication of InAlN films by reactive sputtering with glancing-angle deposition scheme

〇Yoshiyuki Nakayama¹, Masashi Hosoya¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst of Tech., 2.Kanto Gakuin Univ.)