Takeshi Tokorozuki

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:15 PM - 5:15 PM M136 (H136)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11p-M136-1~14] 13.3 Insulator technology

5:00 PM - 5:15 PM

[11p-M136-14] Fabrication of HfO₂/Ge direct junction structure using Kr/O₂ plasma oxidation method

〇Takeshi Tokorozuki¹, Yoshitaka Iwazaki¹, Tomo Ueno¹ (1.TUAT)