Takashi Hamano

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

1:45 PM - 2:00 PM

△ [11p-W641-1] Optimization of Electrical Characterization Method of Plasma Process-Induced Damage in Si Substrates for the Analysis of Defect Profiles

〇Takashi Hamano¹, Keiichiro Urabe¹, Koji Eriguchi¹ (1.Kyoto Univ.)