Jiawei Ni

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM

▼ [11p-W641-11] Etching reactions of Si, SiO₂, and SiN films using with hydrofluorocarbon compounds

〇(M1)Jiawei Ni¹, Toshio Hayashi¹, Kenji Ishikawa¹, Takayoshi Tsutsumi¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya University)