Masanori Koyama

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Speaker, Author, Co-Author

Sat. Mar 9, 2019 1:45 PM - 5:00 PM S223 (S223)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[9p-S223-1~12] 7.3 Micro/Nano patterning and fabrication

3:00 PM - 3:15 PM

[9p-S223-6] Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography

〇(D)Masanori Koyama¹, Masamitsu Shirai¹, Hiroaki Kawata¹, Yoshihiko Hirai¹, Masaaki Yasuda¹ (1.Osaka Pref. Univ.)