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Poster presentation

15 Crystal Engineering » 15.5 Group IV crystals and alloys

[11p-PA5-1~3] 15.5 Group IV crystals and alloys

Mon. Mar 11, 2019 1:30 PM - 3:30 PM PA5 (PA)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 3:30 PM

[11p-PA5-1] Evaluation of strain in strained Si films formed on the (110) surface using Raman spectroscopy

〇Keisuke Arimoto¹, Atsushi Onogawa¹, Shingo Saito¹, Kosuke Hara¹, Junji Yamanaka¹, Kiyokazu Nakagawa¹ (1.Univ. of Yamanashi)

1:30 PM - 3:30 PM

[11p-PA5-2] Fully compressively strained SiGe thin film formation technique using Sputter Epitaxy method

〇Shota Nozaki¹ (1.Tokyo Univ. of Agric. &Technol.)

1:30 PM - 3:30 PM

[11p-PA5-3] Si Epitaxial Growth on Epitaxial Graphene using Ultra Thin AlN Intermediate Layer

〇Taiji Terai¹, Daiki Ishimaru, Yuta Kamada¹, Tomoya Takeuchi¹, Akihiro Hashimoto¹ (1.Fukui Univ.)

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