Shota Nozaki

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:30 PM - 3:30 PM PA5 (PA)

Poster presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[11p-PA5-1~3] 15.5 Group IV crystals and alloys

1:30 PM - 3:30 PM

[11p-PA5-2] Fully compressively strained SiGe thin film formation technique using Sputter Epitaxy method

〇Shota Nozaki¹ (1.Tokyo Univ. of Agric. &Technol.)