The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.6 Plasma Electronics English Session

[10a-M103-1~7] 8.6 Plasma Electronics English Session

Sun. Mar 10, 2019 9:00 AM - 10:45 AM M103 (H103)

Hiroto Matsuura(Osaka Pref. Univ.)

9:15 AM - 9:30 AM

[10a-M103-2] Oxygen Radical Measurement of Atmospheric Pressure Microwave Line Plasma by Vacuum Ultraviolet Absorption Spectroscopy

〇(M2)Hansin BAE1, Koike Yosuke1, Hirotsugu Koma1, Haruka Suzuki1, Seigo Takashima3, Hirotaka Toyoda1,2 (1.Nagoya Univ., 2.PLANT, Nagoya Univ., 3.Industries Promotion Corporation, Nagoya)

Keywords:O radical diagnostic, Atmospheric pressure plasma

We have developed atmospheric pressure microwave line plasma (APMLP) source of ~1 m in length. In this study, O radical density of APMLP is measured by vacuum ultra violet absorption spectroscopy (VUVAS) and O2 gas flow rate dependence of O radical density is measured. Furthermore, spatial dependences of O radical density along the long plasma is measured.