The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.2 Carbon-based thin films

[10a-M113-1~6] 6.2 Carbon-based thin films

Sun. Mar 10, 2019 10:00 AM - 11:30 AM M113 (H113)

Takako Nakamura(AIST)

10:00 AM - 10:15 AM

[10a-M113-1] A Study of SOI Wafer with SiC-BOX Layer using Room-Temperature Bonding

Yoshihiro Koga1, Kazunari Kurita1 (1.SUMCO CORPORATION)

Keywords:SOI wafer, SiC, Room-temprature bonding

We have been studying a new SOI wafer with SiC-BOX layer to suppress self-heating of power devices. In this studying, we demonstrated that the SOI wafer was fabricated by bonding at room temprature in ultrahigh vacuum.