Sb-doped solid-phase crystallization for high-quality n-type polycrystalline Ge films

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Sun. Mar 10, 2019 9:00 AM - 12:00 PM M114 (H114)

Takashi Noguchi(Univ. of the Ryukyus), Seiichiro Higashi(Hiroshima Univ.)

9:15 AM - 9:30 AM

〇Masaya Saito¹, Daichi Takahara¹, Toshifumi Imajo¹, Kenta Moto¹, Takashi Suemasu¹, Kaoru Toko¹ (1.Univ. of Tsukuba)

Keywords:Ge, solid-phase crystallization, low temperature formation