[10a-PA3-1~10] 6.1 Ferroelectric thin films

[10a-PA3-5] Fabrication of BaTiO₃ film by reactive sputtering method

〇Ao Makino¹, Masamichi Nishide², Ken Nishida¹ (1.Natinal Defense Academy, 2.Leading Technology Lab)

Keywords:BaTiO3, reactive sputtering

In this study, we investigated that it is impossible to improve the film formation rate of barium titanate thin film, which is compatible with suppressing oxidation of the target directly and increasing the oxidation rate on the substrate by directly blowing oxygen onto the substrate. In addition to the outline description of the device, barium titanate formed by the examined method (metal mode) and barium titanate formed by the accompanying method (compound mode) were evaluated and compared.