[10a-PB2-1~18] 13.2 Exploratory Materials, Physical Properties, Devices

[10a-PB2-18] Fabrication of high quality iron oxide thin film on Si substrate using buffer layer

〇Kenta Yamanaka^1,2, Kengo Takano^1,2, Kenji Yamaguchi² (1.Ibaraki Univ., 2.QST)

Keywords:semiconductor, thin films, sputter deposition