[10a-S224-1~8] 7.5 Ion beams

[10a-S224-5] Fabrication of 3D structure by double-angled etching with reactive gas cluster injection (II)

〇Toshio Seki¹, Hiroki Yamamoto², Takahiro Kozawa³, Tadashi Syojo⁴, Kunihiko Koike⁴, Takaaki Aoki⁵, Jiro Matsuo¹ (1.Grad. Sch. of Eng., Kyoto Univ., 2.QST, 3.ISIR Osaka Univ., 4.Iwatani Corp., 5.ACCMS, Kyoto Univ.)

Keywords:cluster, neutral beam, etching