The 66th JSAP Spring Meeting, 2019

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7 Beam Technology and Nanofabrication » 7.5 Ion beams

[10a-S224-1~8] 7.5 Ion beams

Sun. Mar 10, 2019 9:30 AM - 11:30 AM S224 (S224)

Satoshi Abo(Osaka Univ.), Takaaki Aoki(Kyoto Univ.)

10:30 AM - 10:45 AM

[10a-S224-5] Fabrication of 3D structure by double-angled etching with reactive gas cluster injection (II)

〇Toshio Seki1, Hiroki Yamamoto2, Takahiro Kozawa3, Tadashi Syojo4, Kunihiko Koike4, Takaaki Aoki5, Jiro Matsuo1 (1.Grad. Sch. of Eng., Kyoto Univ., 2.QST, 3.ISIR Osaka Univ., 4.Iwatani Corp., 5.ACCMS, Kyoto Univ.)

Keywords:cluster, neutral beam, etching